Title:
基板表面の検査方法及び検査装置
Document Type and Number:
Japanese Patent JP5615489
Kind Code:
B2
Abstract:
A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection.
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Inventors:
内藤 儀彦
木村 憲雄
寺尾 健二
畠山 雅規
伊藤 正光
木村 憲雄
寺尾 健二
畠山 雅規
伊藤 正光
Application Number:
JP2008205097A
Publication Date:
October 29, 2014
Filing Date:
August 08, 2008
Export Citation:
Assignee:
株式会社荏原製作所
株式会社東芝
株式会社東芝
International Classes:
G01N23/203; G01N23/225; G03F1/84; G03F1/86
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito