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Title:
露光方法、露光装置、パターン形成方法、およびデバイス製造方法
Document Type and Number:
Japanese Patent JP5644779
Kind Code:
B2
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Inventors:
木内 徹
水谷 英夫
Application Number:
JP2011552796A
Publication Date:
December 24, 2014
Filing Date:
February 02, 2011
Export Citation:
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Assignee:
株式会社ニコン
International Classes:
G03F7/20; G03F7/213; G03F7/22; H01L21/027
Domestic Patent References:
JP2008268950A2008-11-06
JP2010266495A2010-11-25
JP2010287643A2010-12-24
JP2007114385A2007-05-10
JPH0378238A1991-04-03
JPH0562878A1993-03-12
JP2008268950A2008-11-06
JP2010266495A2010-11-25
JP2010287643A2010-12-24
Foreign References:
WO2007141852A12007-12-13
WO2007100087A12007-09-07
WO2007141852A12007-12-13
Attorney, Agent or Firm:
Masatake Shiga
Norio Takahashi



 
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