Title:
半導体ウェーハ処理システムのシャワーヘッドのための上下続きの２つのガスのフェースプレート
Document Type and Number:
Japanese Patent JP5658701
Kind Code:
B2
Abstract:
A one-piece gas distribution faceplate (1502) for a showerhead. The one-piece gas distribution faceplate (1502) includes a first surface (1504), a second surface (1506), and a third surface. The one-piece gas distribution faceplate comprises a plurality of first gas holes (1510) extending through the one-piece gas distribution faceplate between the first surface (1504) and the second surface (1506). The one-piece gas distribution faceplate (1502) has an internal gas distribution cavity (1509) defined by a plurality of interconnecting channels (1512B). A plurality of second gas holes (1520) extend through the one-piece gas distribution faceplate between the first surface (1504) into a plurality of the interconnecting channels (1512B). The interconnecting channels are fluidly coupled to a plenum (1606) that is in turn connected to at least one gas conduit (1630). The gas conduit extends to the third surface.
Inventors:
サルバドー ピー ウモートイ
ローレンス シー レイ
アン エヌ ンギュイエン
スティーヴ エイチ チャオ
ローレンス シー レイ
アン エヌ ンギュイエン
スティーヴ エイチ チャオ
Application Number:
JP2012028544A
Publication Date:
January 28, 2015
Filing Date:
February 13, 2012
Export Citation:
Assignee:
アプライド マテリアルズ インコーポレイテッドＡＰＰＬＩＥＤ ＭＡＴＥＲＩＡＬＳ，ＩＮＣＯＲＰＯＲＡＴＥＤ
International Classes:
C23C16/455; H01L21/00; H01L21/28; H01L21/285; H01L21/31; C23C16/44
Attorney, Agent or Firm:
辻居 Koichi
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Sadao Kumakura
Fumiaki Otsuka
Takayoshi Nishijima
Hiroyuki Suda
Hiroshi Uesugi