ブロックコポリマーを含む層のパターン形成方法

Title:

ブロックコポリマーを含む層のパターン形成方法

Document Type and Number:

Japanese Patent JP5721164

Kind Code:

B2

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Inventors:

Masaki Saki
Naohiro Dazai
Ken Miyagi
Shigenori Fujikawa
Harumi Hayakawa
Mari Koizumi

Application Number:

JP2010205890A

Publication Date:

May 20, 2015

Filing Date:

September 14, 2010

Export Citation:

Assignee:

Tokyo Ohka Kogyo Co., Ltd.
RIKEN

International Classes:

B82B3/00; B05D5/12; B82Y40/00; G03F7/038; G03F7/40; H01L21/027

Domestic Patent References:

JP2008036491A
JP2011079877A

Foreign References:

Attorney, Agent or Firm:

Sumio Tanai
Masatake Shiga
Suzuki Mitsuyoshi
Mitsunaga Igarashi

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