基板の緩衝層用イットリア溶液の製造方法 - Korea Electrotechnology Research Institute

Title:

基板の緩衝層用イットリア溶液の製造方法

Document Type and Number:

Japanese Patent JP5728528

Kind Code:

B2

Abstract:

PROBLEM TO BE SOLVED: To provide a production method of a yttria solution for a buffer layer of a substrate, which is applied to an upper face of a substrate so as to flatten the substrate and simultaneously to serve as the buffer layer.SOLUTION: A production method of a yttria solution for a buffer layer of a substrate includes: a first step of mixing yttrium acetate tetrahydrate with methanol so as to form a mixture, and stirring the mixture; a second step of charging diethanolamine to the mixture of the first step as a chelating agent and synthesizing a synthetic product by stirring; and a third step of filtering the synthetic product synthesized in the second step by using a filter so as to obtain a sol. Thereby the yttria solution made via a sol-gel process is produced. The yttria solution is applied to an upper face of a substrate so as to flatten the substrate, and has an advantage of simultaneously serving as the buffer layer as a diffusion barrier to prevent diffusion of a substrate material.

Inventors:

Ko, rock kill
Ha, Dong Woo
Song, Myung Hwan
Kim, Dong Hyuk
Kang, Bomin

Application Number:

JP2013122568A

Publication Date:

June 03, 2015

Filing Date:

June 11, 2013

Export Citation:

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