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Patent Searching and Data


Title:
MEMSデバイス及びその製造方法
Document Type and Number:
Japanese Patent JP5771916
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a MEMS device which can reduce influence on a characteristic of a MEMS (Micro Electro Mechanical Systems) element with hardly being affected by external environments of moisture and temperature, etc.SOLUTION: The MEMS device includes: the substrate; the MEMS element arranged on the substrate and including a support part, a movable part displacing in relation to the support part and a lid member covering the movable part and fixed to the support part; a foam covering at least the surrounding of the MEMS element. This method is provided to manufacture the MEMS device in which the MEMS element including the support part, and the movable part displacing in relation to the support part and the lid member covering the movable part and fixed to the support part is arranged on the substrate, foamed resin is dropped on the MEMS element and foamed resin is foamed.

Inventors:
Satoru Kuramochi
Application Number:
JP2010174908A
Publication Date:
September 02, 2015
Filing Date:
August 03, 2010
Export Citation:
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Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
B81B1/00; B81C3/00; H01L21/56; H01L23/29; H01L23/31
Domestic Patent References:
JP2005129888A
JP2010021225A
JP59186352A
JP2009038053A
JP2005285864A
JP6143884A
JP2006153799A
JP2004257841A
JP2010153751A
JP4047241A
JP63169167A
JP2009226571A
Foreign References:
US20080283988
Attorney, Agent or Firm:
Takahashi Hayashi & Partners