Title:
パターン形成方法、及び、電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP5785754
Kind Code:
B2
Abstract:
A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.
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Inventors:
Shuhei Yamaguchi
Hidetomo Takahashi
Shirakawa Mitsuhiro
Kataoka Shohei
Shoichi Saito
Fumihiro Yoshino
Hidetomo Takahashi
Shirakawa Mitsuhiro
Kataoka Shohei
Shoichi Saito
Fumihiro Yoshino
Application Number:
JP2011075855A
Publication Date:
September 30, 2015
Filing Date:
March 30, 2011
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/038; C07C69/757; C08F220/28; G03F7/004; G03F7/039; G03F7/32; G03F7/38
Domestic Patent References:
| JP2007086528A | ||||
| JP2008209889A | ||||
| JP2010113319A | ||||
| JP2012073565A | ||||
| JP2012032806A |
Attorney, Agent or Firm:
Takeshi Takamatsu
Toshiyuki Ozawa
Hasegawa Hiromichi
Toshiyuki Ozawa
Hasegawa Hiromichi