Title:
反射防止／防曇コーティング
Document Type and Number:
Japanese Patent JP5819198
Kind Code:
B2
Abstract:
The invention relates to a composition, comprising a) porous silica nanoparticles, b) one or more organic soluble polymer resins, c) one or more UV-cross linkable reactive diluents, d) solvents and e) a UV-initiator system. The invention further relates to the use of the composition for coating transparent substrates, and to substrates that are coated with formulations of said kind.
Inventors:
Karl Heinz Hildenbrand
Peter Capellen
Friedrich-Karl Bruder
Peter Capellen
Friedrich-Karl Bruder
Application Number:
JP2011549465A
Publication Date:
November 18, 2015
Filing Date:
February 02, 2010
Export Citation:
Assignee:
Bayer MaterialScience AG
International Classes:
C08F2/44; C08K3/36; C08L33/04; C08L101/02; C09D4/02; C09D5/00; C09D7/61; C09D133/00; C09D133/04
Domestic Patent References:
| JP2006306950A | ||||
| JP2003027003A | ||||
| JP5098189A | ||||
| JP2008248214A | ||||
| JP7048117A |
Attorney, Agent or Firm:
Hirohito Katsunuma
Hiroshi Sorimachi
Suzuki Keiyasu
Hiroshi Sorimachi
Suzuki Keiyasu