Title:
プラズマ処理装置
Document Type and Number:
Japanese Patent JP5843602
Kind Code:
B2
Abstract:
Provided is a substrate processing apparatus including an openable and closable lid and being capable of precisely controlling a gap between multiple shields. The substrate processing apparatus includes: an openable and closable lid provided on an opening of a chamber; a first shield provided on a surface of the lid at the chamber side and having an insertion hole; an insertion section fixed to the lid while inserted through the insertion hole, and configured to support the first shield in a manner movable within a predetermined distance; a restriction section provided on an end portion of the insertion section and configured to restrict the movement of the first shield; and biasing means configured to bias the first shield to a member provided inside the chamber when the lid is closed.
Inventors:
Toshikazu Nakazawa
Norifumi Tsukamoto
Keisuke Ueda
Eiji Ozaki
Norifumi Tsukamoto
Keisuke Ueda
Eiji Ozaki
Application Number:
JP2011281014A
Publication Date:
January 13, 2016
Filing Date:
December 22, 2011
Export Citation:
Assignee:
Canon ANELVA Corporation
International Classes:
C23C14/00; C23C14/34; H01L21/205; H01L21/285; H01L21/3065
Domestic Patent References:
| JP1107542A | ||||
| JP2004076069A | ||||
| JP2002110649A | ||||
| JP2009301802A | ||||
| JP2002356771A | ||||
| JP2010013707A | ||||
| JP10046333A | ||||
| JP2009529249A | ||||
| JP3123802U |
Attorney, Agent or Firm:
Iwata Today sentence
Hideo Mano
Hideo Mano