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Title:
電子銃装置、ウェーハ画像化システム、及び電子銃装置のエクストラクタ電極の少なくとも1つの表面をクリーニングする方法
Document Type and Number:
Japanese Patent JP5843909
Kind Code:
B2
Abstract:
A gun arrangement configured for generating a primary electron beam for a wafer imaging system is described. The arrangement includes a controller (116) configured for switching between normal operation an cleaning operation, a field emitter having an emitter tip (15) adapted for providing electrons, wherein the field emitter is selected from the group consisting of: a cold field emitter and a thermally assisted cold field emitter, and wherein the emitter is electrically connected to the controller, a suppressor electrode (9)arranged radially outside the emitter, particularly wherein the emitter tip is protruding through the suppressor electrode, an extractor electrode (8) adapted for extracting the electron beam from the emitter tip electrode, and at least one auxiliary emitter electrode (16) arranged radially outside the suppressor electrode, and provided as a thermal electron emitter for thermally emitting electrons towards the optical axis. At least one of the suppressor electrode and the extractor electrode is electrically connected to the controller such that the suppressor electrode is a first potential relative to the extractor electrode during normal operation and at a second potential relative to the extractor electrode during cleaning operation.

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Inventors:
Pavel Adamek
Application Number:
JP2014049959A
Publication Date:
January 13, 2016
Filing Date:
March 13, 2014
Export Citation:
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Assignee:
ICT Integrated Circuit Testing Gesell Shaft Feer Hull Priter Brief Tehnik M B Her
International Classes:
H01J37/073
Domestic Patent References:
JP2012174691A
JP63259948A
JP2006519462A
Foreign References:
US20110084219
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Disciple Maru Ken
Ino Sato
Mitsuru Matsushita
Ichiro Kurasawa
Yasushi Yamamoto