Title:
電子線応用装置およびレンズアレイ
Document Type and Number:
Japanese Patent JP5886663
Kind Code:
B2
Abstract:
There is provided both an electron beam apparatus and a lens array, capable of correcting a curvature of field aberration under various optical conditions. The electron beam apparatus comprises the lens array having a plurality of electrodes, and multiple openings are formed in the respective electrodes. An opening diameter distribution with respect to the respective opening diameters of the plural openings formed in the respective electrodes are individually set, and voltages applied to the respective electrodes are independently controlled to thereby independently adjust an image forming position of a reference beam, and a curvature of the lens array image surface.
Inventors:
Akiyoshi Tanimoto
Hiroya Ota
Shin Sakakibara
Enyama Hyakuyo
Norifumi Tanimoto
Hiroya Ota
Shin Sakakibara
Enyama Hyakuyo
Norifumi Tanimoto
Application Number:
JP2012063816A
Publication Date:
March 16, 2016
Filing Date:
March 21, 2012
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
H01J37/12; H01J37/153; H01L21/66
Domestic Patent References:
| JP2007513460A | ||||
| JP2007123599A | ||||
| JP2004235435A | ||||
| JP9288991A |
Attorney, Agent or Firm:
Yamato Tsutsui