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Patent Searching and Data


Title:
吸着方法及び真空処理方法
Document Type and Number:
Japanese Patent JP6312926
Kind Code:
B2
Abstract:
Providing a technique for suppressing dust generation at the time of attraction and detachment of an object to be attracted, and for enabling control the attraction force of the attraction device to be uniform. The attraction device of the present invention includes a main body part having attraction electrodes within a dielectric; and an attraction part for attracting a substrate, provided on a surface of the main body part at an attraction-side. The attraction part includes a contact support part that is in contact with, and supports the substrate and a non-contact part that is not in contact with the substrate. In the attraction part, the volume resistivity of the material of the contact support part is greater than the volume resistivity of the material of the non-contact part.

Inventors:
Ken Maedaira
Fuwa Tillage
Application Number:
JP2017510247A
Publication Date:
April 18, 2018
Filing Date:
April 01, 2016
Export Citation:
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Assignee:
ULVAC, Inc.
International Classes:
H01L21/683; C23C14/50; H02N13/00
Domestic Patent References:
JP2006287210A
JP2015508229A
JP2009302347A
Foreign References:
WO2012026421A1
WO2013047647A1
Attorney, Agent or Firm:
Hideki Abe
Shigeo Ishijima