Title:
ブロック共重合体組成物及びそれに関連する方法
Document Type and Number:
Japanese Patent JP6400912
Kind Code:
B2
Abstract:
A copolymer composition is provided including a block copolymer having a poly(acrylate) block and a poly(silyl acrylate) block; wherein the block copolymer exhibits a number average molecular weight, MN, of 1 to 1,000 kg/mol; and, wherein the block copolymer exhibits a polydispersity, PD, of 1 to 2. Also provided are substrates treated with the copolymer composition.
Inventors:
Peter Trefonas
Philip Fustad
Shin Woo Gu
Erin Vogel
Bailey ginsburg
See-Way Chang
Daniel Marie
Philip Fustad
Shin Woo Gu
Erin Vogel
Bailey ginsburg
See-Way Chang
Daniel Marie
Application Number:
JP2014015404A
Publication Date:
October 03, 2018
Filing Date:
January 30, 2014
Export Citation:
Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
C08L53/00; C08F297/02; C08K5/13; C08K5/375; C08K5/524
Domestic Patent References:
| JP4506679A | ||||
| JP2004078223A | ||||
| JP2004258380A | ||||
| JP2007266392A | ||||
| JP2008036491A | ||||
| JP2008520450A | ||||
| JP2009520074A | ||||
| JP2010144120A |
Other References:
C.Bressy et al.,Poly(trialkylsilyl methacrylate)s:A family of hydrolysable polymers with tuneable erosion profiles,Polymer Degradation and Stability,2010年,95,1260-1268
R. L. Bruce et al.,Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma,J. Vac. Sci. Technol. B,American Vacuum Society,2010年 7月 6日,28(4),751-757
R. L. Bruce et al.,Molecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma,J. Vac. Sci. Technol. B,American Vacuum Society,2010年 7月 6日,28(4),751-757
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office