Title:
塩、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6413373
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt for an acid generator which is used for a resist composition capable of producing a resist pattern with excellent line edge roughness (LER).SOLUTION: The salt is represented by formula (I0). [In the formula (I0), Rrepresents an acid-labile group; Rand Reach independently represent a hydrogen atom or a C1-C6 alkyl group; m and n each independently represent 1 or 2; when m is 2, two Rs are the same or different; when n is 2, two Rs are the same or different; Ar represents an optionally substituted aromatic hydrocarbon group or an optionally substituted heteroaromatic hydrocarbon group; and Arepresents an organic anion.]
Inventors:
Yukako Adachi
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2014121338A
Publication Date:
October 31, 2018
Filing Date:
June 12, 2014
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D335/02; G03F7/004; G03F7/038; G03F7/039
Domestic Patent References:
| JP2015027992A | ||||
| JP2015024978A |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto