Title:
イオン注入装置のＳｉＣコーティング
Document Type and Number:
Japanese Patent JP6450372
Kind Code:
B2
Inventors:
Robert Jay Mason
Chardall Patel
Robert H Bettencourt
Timothy Jay Miller
Chardall Patel
Robert H Bettencourt
Timothy Jay Miller
Application Number:
JP2016516865A
Publication Date:
January 09, 2019
Filing Date:
September 24, 2014
Export Citation:
Assignee:
Varian Semiconductor Equipment Associates, Inc.
International Classes:
C23C14/48; H01J27/02; H01J37/08; H01J37/317; H01L21/265
Domestic Patent References:
| JP9259779A | ||||
| JP2009520324A | ||||
| JP2001316821A |
Foreign References:
| US20130108863 |
Attorney, Agent or Firm:
Kenji Sugimura
Makoto Fukuo
Masaaki Ishikawa
Makoto Fukuo
Masaaki Ishikawa