Title:
荷電粒子光学装置
Document Type and Number:
Japanese Patent JP6469699
Kind Code:
B2
Abstract:
The invention relates to a charged particle optical device for manipulating a trajectory of multiple beamlets of charged particles. Said charged particle optical device comprising an electromagnetic deflector comprising a planar substrate having an upper side and a lower side of said substrate, and an even thickness. The substrate comprises: a through opening for passing said beamlets there through, wherein said through opening debouches in the upper and lower side of said substrate; a first and a second coil, wherein each of said coils preferably is a substantially helical coil and comprises conducting upper leads arranged at the upper side, conducting lower leads arranged at the lower side, and vias extending through said substrate and which conductively connect one of said upper leads with one of said lower leads for forming said coil; wherein said first and second coils are arranged on either side of the through opening.
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Inventors:
Hathor, Sohail
Wittefaen, Jost
Rosenthal, Aaron
Conning, johan yoest
Wittefaen, Jost
Rosenthal, Aaron
Conning, johan yoest
Application Number:
JP2016540837A
Publication Date:
February 13, 2019
Filing Date:
September 05, 2014
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01J37/147; H01J37/28; H01J37/305; H01L21/027
Domestic Patent References:
| JP4179116A | ||||
| JP2012182294A | ||||
| JP2013529360A |
Attorney, Agent or Firm:
Takayuki Hirose
Daisuke Seki
Daisuke Seki
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