Title:
化学蒸着システム用の複合半径を有する保持ポケットを有するウェハキャリア
Document Type and Number:
Japanese Patent JP6559706
Kind Code:
B2
Abstract:
A wafer carrier for use in a chemical vapor deposition (CVD) system includes a plurality of wafer retention pockets, each having a peripheral wall surface surrounding a floor surface and defining a periphery of that wafer retention pocket. Each wafer retention pocket has a periphery with a shape defined by at least a first arc having a first radius of curvature situated around a first arc center and a second arc having a second radius of curvature situated around a second arc center. The second arc is different from the first arc, either by its radius of curvature, arc center, or both.
Inventors:
Krishnan, Sandeep
Urban, Lucas
Urban, Lucas
Application Number:
JP2016566865A
Publication Date:
August 14, 2019
Filing Date:
January 26, 2015
Export Citation:
Assignee:
Beco Instruments Incorporated
International Classes:
H01L21/205; C23C16/458; H01L21/683
Domestic Patent References:
| JP2012501541A | ||||
| JP2011233865A | ||||
| JP59220917A | ||||
| JP63226025A | ||||
| JP8078347A | ||||
| JP10087394A | ||||
| JP2006013020A | ||||
| JP2007294942A | ||||
| JP2010027881A | ||||
| JP2011165697A | ||||
| JP2013222948A | ||||
| JP2014127612A |
Foreign References:
| WO2014196323A1 |
Attorney, Agent or Firm:
Makoto Onda
Hironobu Onda
Atsushi Honda
Hironobu Onda
Atsushi Honda