Title:
レーザシステム又はレーザ露光システム
Document Type and Number:
Japanese Patent JP6581077
Kind Code:
B2
Abstract:
A laser exposure system may include a plurality of laser devices configured to output laser beams with which an irradiated subject is irradiated, and at least one beam property adjustment unit disposed on optical paths of the laser beams outputted from the plurality of laser devices, and configured to allow beam properties of the laser beams to be approximately a same as each other.
Inventors:
Wakabayashi Osamu
Koji Kakizaki
Junichi Fujimoto
Koji Kakizaki
Junichi Fujimoto
Application Number:
JP2016511202A
Publication Date:
September 25, 2019
Filing Date:
March 31, 2014
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H01L21/268; B23K26/064; H01L21/20
Domestic Patent References:
| JP2001023919A | ||||
| JP2007103962A | ||||
| JP2005101202A | ||||
| JP2119128A | ||||
| JP2009134316A | ||||
| JP2006078655A | ||||
| JP2005294493A | ||||
| JP2002176006A |
Attorney, Agent or Firm:
Kenzo Matsuura