Title:
大気圧プラズマ発生装置
Document Type and Number:
Japanese Patent JP6587689
Kind Code:
B2
Abstract:
Plasma emitting device 10 is provided with main body section 12, pair of electrodes 14 and 16, gas supply device 20, and laser emitting device 22. Gas supply device 20 supplies processing gas insider main body section 12. Then, voltage is applied to electrodes 14 and 16 such that electrical discharge occurs between electrodes 14 and 16, which causes the processing gas flowing inside cylindrical section 23 of main body section 12 to be plasmarized. Accordingly, plasma emitted from the opening on the end surface of cylindrical section 23 opposite to the end to which laser emitting device 22 is connected is emitted in an axial direction of cylindrical section 23. Also, laser emitting device 22 emits laser light in an axial direction of cylindrical section 23. Accordingly, due to the light, it is possible to visually check the plasma emission position, and it is possible to appropriately apply plasma to a target body.
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Inventors:
Takahiro Kondo
Application Number:
JP2017537133A
Publication Date:
October 09, 2019
Filing Date:
September 02, 2015
Export Citation:
Assignee:
Fuji corporation
International Classes:
H05H1/24; A61B18/12; A61N1/44; B01J19/08
Domestic Patent References:
| JP2010536123A | ||||
| JP2011154951A |
Foreign References:
| US20140188195 |
Attorney, Agent or Firm:
Patent business corporation NEXT
Yasutaka Fukatsu
Yuki Kataoka
Yasutaka Fukatsu
Yuki Kataoka