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Title:
濾過装置及び濾過装置のフィルター洗浄方法
Document Type and Number:
Japanese Patent JP6608631
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To remove effectively deposit articles inside the filter medium and on the filtered liquid chamber side surface of a filter which are generated by reverse washing and others without detaching the filter.SOLUTION: In a filter device which includes a fluid inlet 6 and a fluid outlet 7 and comprises a casing 1 provided inside with a raw liquid chamber 8 that communicates with the fluid inlet 6 and stores the fluid before filtration and a filtered liquid chamber 9 that communicates with the fluid outlet 7 and stores the fluid after filtration, and a filter 3 that is installed inside the casing 1 and filters the fluid by passing the same from the raw liquid chamber 8 side to the filtered liquid chamber 9 side, and in which reverse washing can be realized to remove captured articles deposited on the filter 3 by passing the fluid from the filtered liquid chamber 9 side to the raw liquid chamber 8 side, provided is a high pressure cleaning mechanism 5 in which high-pressure fluid is ejected so as to pass the filter 3 from the raw liquid chamber 8 side to the filtered liquid chamber 9 side and deposit articles inside the filter medium and on the filtered liquid chamber 9 side surface of the filter 3 are removed by high pressure cleaning.SELECTED DRAWING: Figure 1

Inventors:
Yuichi Takahashi
Hiroyuki Takahashi
Satoshi Ito
Application Number:
JP2015126974A
Publication Date:
November 20, 2019
Filing Date:
June 24, 2015
Export Citation:
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Assignee:
Fuji Filter Industry Co., Ltd.
International Classes:
B01D33/06; B01D33/58; B01D33/80
Domestic Patent References:
JP2005088835A
JP2014162411A
JP6055018A
JP50039254B1
JP30000186B1
JP2000070615A
Foreign References:
WO2014159327A1
Attorney, Agent or Firm:
Moriaki Ogawa
Haruyuki Nishiyama
Ryokichi Arai