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Patent Searching and Data


Title:
半導体装置
Document Type and Number:
Japanese Patent JP6624300
Kind Code:
B2
Abstract:
A semiconductor device is provided that includes: an edge termination portion provided in the peripheral portion of a semiconductor substrate; and an active portion surrounded by the edge termination portion, wherein the active portion includes: a plurality of gate trench portions arrayed along a predetermined array direction; a plurality of dummy trench portions provided between a gate trench portion closest to the edge termination portion among the plurality of gate trench portions and the edge termination portion; mesa regions located between each of the plurality of dummy trench portions; and accumulation regions with a first conductivity-type provided in at least a part of the mesa regions.

Inventors:
Tatsuya Naito
Application Number:
JP2018546329A
Publication Date:
December 25, 2019
Filing Date:
October 16, 2017
Export Citation:
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Assignee:
Fuji Electric Co., Ltd.
International Classes:
H01L29/739; H01L21/822; H01L21/8234; H01L21/8249; H01L27/04; H01L27/06; H01L27/088; H01L29/06; H01L29/12; H01L29/41; H01L29/417; H01L29/423; H01L29/49; H01L29/78
Domestic Patent References:
JP9270512A
JP2005294649A
JP2007134625A
JP2010118642A
JP2013021104A
JP2013026534A
JP2014132625A
JP2015135954A
JP2016029710A
JP2016082097A
JP2016082167A
Foreign References:
WO2006082618A1
Attorney, Agent or Firm:
Longhua International Patent Service Corporation