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Title:
平版印刷用インキ、平版インキ用ワニスおよびそれを用いた印刷物の製造方法
Document Type and Number:
Japanese Patent JP6652508
Kind Code:
B2
Abstract:
A lithographic ink which has a highly sensitive curability for active energy beam simultaneously with a high washability with water, and which also has excellent resistance to surface staining in the printing and high water resistance of the cured film is provided. Also provided are a varnish for such lithographic ink and a method for producing printed material. The lithographic ink comprises (a) a pigment and (b) a resin having an ethylenically unsaturated group and a hydrophilic group, and it has a highly sensitive curability for active energy beam simultaneously with a high washability with water, and also, excellent resistance to surface staining in the printing and high water resistance of the cured film.

Inventors:
Inoue Takejiro
Yuichi Tsuji
Seiichiro Murase
Sadakuni Hironobu
Application Number:
JP2016573144A
Publication Date:
February 26, 2020
Filing Date:
September 20, 2016
Export Citation:
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Assignee:
TORAY INDUSTRIES,INC.
International Classes:
C09D11/02; B41M1/06; B41M1/08; B41M1/30; C09D11/101
Other References:
製品ガイド,ビックケミー・ジャパン株式会社,2015年 5月,第7版,p1-3,URL,https://www.byk.com/fileadmin/byk/company/BYK_Japan_Product_Guide/Product_Guide_Overall.pdf
顔料湿潤・分散剤の作用と種類,Kusumoto Chemical, Ltd.,2002年,p1-3,URL,https://www.kusumoto.co.jp/wp-content/uploads/2016/08/ganryo.pdf
Attorney, Agent or Firm:
Seiryu International Patent Service Corporation
Takayoshi in the daytime
Masao Sakaizawa