Title:
露光装置、露光システム、および物品の製造方法
Document Type and Number:
Japanese Patent JP6661270
Kind Code:
B2
Abstract:
An exposure apparatus exposes a peripheral portion of a substrate to light, and includes an optical system configured to irradiate the substrate with the light, a stage configured to hold the substrate and be moved in a direction to position the substrate in a direction perpendicular to the optical axis of the optical system, and a controller configured to cause the stage to be moved. The controller moves the stage based on information about a distance between the optical system and the peripheral portion in a direction parallel to the optical axis and a telecentricity of the optical system so that a predetermined portion of the substrate is irradiated with the light from the optical system.
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Inventors:
Saito Junkei
Application Number:
JP2015007122A
Publication Date:
March 11, 2020
Filing Date:
January 16, 2015
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; G03F7/20; H01L21/68
Domestic Patent References:
| JP9260263A | ||||
| JP2011014745A | ||||
| JP2000091226A |
Foreign References:
| WO2007083758A1 |
Attorney, Agent or Firm:
Ryoichi Takaoka
Nao Oda
Nao Oda