Title:
マイクロレンズアレイを含む光学系の製造方法
Document Type and Number:
Japanese Patent JP6664621
Kind Code:
B2
Abstract:
This invention provides a microlens array in which the layout of microlenses is made to vary or the shapes of said microlenses are made to vary so as to reduce unevenness in the resulting light-intensity distribution, including unevenness stemming from diffraction at the apertures of single microlenses. Said microlens array comprises N microlenses arranged on an x-y plane. The points consisting of the projections of the apices of the respective microlenses onto the x-y plane are located near the points of a reference grid structure in the x-y plane for which the grid spacing in a prescribed direction is D/M mm (M being a positive integer). The distance between each pair of facing sides of each microlens, treating the boundary lines between the microlenses as the sides of the microlenses, is approximately equal to D. The distances between the point consisting of the projection of the apex of each lens onto the x-y plane to the lines consisting of the projections of the sides of that lens onto the x-y plane are D/2+ϵi, and letting n represent the index of refraction of the material constituting each microlens, letting R (in mm) represent the radius of curvature in the abovementioned prescribed direction near the center of that microlens, and letting f (in mm) represent the focal length of that microlens, the following relations are satisfied.
Inventors:
Daisuke Seki
Kayoko Fujimura
Masato Okano
Nishio Konobu
Tomohito Kuwagaki
Kayoko Fujimura
Masato Okano
Nishio Konobu
Tomohito Kuwagaki
Application Number:
JP2016523513A
Publication Date:
March 13, 2020
Filing Date:
May 26, 2015
Export Citation:
Assignee:
Nalux Co., Ltd.
International Classes:
G02B3/00
Domestic Patent References:
| JP2013250336A |
Attorney, Agent or Firm:
Naoya Fushimi