Title:
真空排気方法
Document Type and Number:
Japanese Patent JP6667367
Kind Code:
B2
Abstract:
A vacuum exhaust method is for decreasing a pressure in a processing chamber in which a mounting table configured to mount thereon a substrate is provided by using a gas exhaust unit. The vacuum exhaust method includes mounting a non-evaporated getter (NEG) on the mounting table, and adsorbing an active gas in the processing chamber on the NEG mounted on the mounting table. In the adsorbing the active gas, the NEG is maintained at a predetermined temperature.
Inventors:
Tomohiro Saito
Satoshi Mitsunaga
Koji Maeda
Tetsuya Miyashita
Satoshi Mitsunaga
Koji Maeda
Tetsuya Miyashita
Application Number:
JP2016103607A
Publication Date:
March 18, 2020
Filing Date:
May 24, 2016
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
C23C14/54; B01D53/02; B01D53/04; B01J20/02
Domestic Patent References:
| JP2002540944A | ||||
| JP2001524872A | ||||
| JP63182283A |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito