Title:
感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜の生産方法、パターン形成方法、及び、電子デバイスの製造方法
Document Type and Number:
Japanese Patent JP6688811
Kind Code:
B2
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a glass transition temperature of 155° C. or higher, a compound (B) having a glass transition temperature of 150° C. or lower, and a solvent (C). A solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 20% by mass or more. A softening point of the resist pattern formed using the actinic ray-sensitive or radiation-sensitive resin composition is from 130° C. to 170° C.
Inventors:
Kei Tomiga
Kenichi Harada
Shinichi Sugiyama
Fumihiro Yoshino
Hirano Osamu
Kenichi Harada
Shinichi Sugiyama
Fumihiro Yoshino
Hirano Osamu
Application Number:
JP2017557806A
Publication Date:
April 28, 2020
Filing Date:
November 22, 2016
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
G03F7/039; G03F7/004; G03F7/20
Domestic Patent References:
| JP2009063824A | ||||
| JP2015232607A | ||||
| JP9222724A | ||||
| JP2014013381A | ||||
| JP2015057638A |
Attorney, Agent or Firm:
Patent Business Corporation Koei Patent Office