Title:
回転テーブル用ウェーハ保持機構及び方法並びにウェーハ回転保持装置
Document Type and Number:
Japanese Patent JP6690995
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a wafer holding mechanism and method for turntable capable of detecting a wafer, held on the turntable, even during rotation of the turntable, and to provide a wafer rotation retainer.SOLUTION: A wafer holding mechanism for the turntable of a wafer rotation retainer has a rotating shaft, a turntable placed at the tip of the rotating shaft and holding a wafer on the upper surface, a drive motor for supplying power to the rotating shaft, and a wafer detection device attached to the turntable and irradiated with sensor light perpendicularly to the backside of the wafer so that the wafer held on the upper surface of the turntable can be detected.SELECTED DRAWING: Figure 1
Inventors:
Hiroshi Morita
Osamu Yoshida
Hideaki Nagai
Osamu Yoshida
Hideaki Nagai
Application Number:
JP2016101801A
Publication Date:
April 28, 2020
Filing Date:
May 20, 2016
Export Citation:
Assignee:
Sanyasu Semiconductor Industry Co., Ltd.
International Classes:
H01L21/683
Domestic Patent References:
| JP2010232523A | ||||
| JP2000294616A | ||||
| JP2002319563A | ||||
| JP9064155A |
Foreign References:
| US20050076531 |
Attorney, Agent or Firm:
Shinsuke Ishihara