Title:
光酸発生共重合体および関連するフォトレジスト組成物、塗布基板、および電子デバイス形成方法
Document Type and Number:
Japanese Patent JP6706463
Kind Code:
B2
Abstract:
A copolymer include repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl (meth)acrylate in which the C1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R1, R2, R3, X, m, and R5 are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.
Inventors:
Vipple Jane
Owendi Ongai
James W. Sackray
James F Cameron
Owendi Ongai
James W. Sackray
James F Cameron
Application Number:
JP2014247310A
Publication Date:
June 10, 2020
Filing Date:
December 05, 2014
Export Citation:
Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
C08F220/26; G03F7/004; G03F7/038; H01L21/027
Domestic Patent References:
| JP2012073606A | ||||
| JP2012137729A | ||||
| JP2009080161A | ||||
| JP2012140620A | ||||
| JP2007272194A | ||||
| JP2009217253A | ||||
| JP2008133448A | ||||
| JP2009217523A |
Foreign References:
| WO2014069415A1 |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office