Title:
アライメントシステム
Document Type and Number:
Japanese Patent JP6712349
Kind Code:
B2
Abstract:
An alignment system, method and lithographic apparatus are provided for determining the position of an alignment mark, the alignment system comprising a first system configured to produce two overlapping images of the alignment mark that are rotated by around 180 degrees with respect to one another, and a second system configured to determine the position of the alignment mark from a spatial distribution of an intensity of the two overlapping images.
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Inventors:
Matthewsen, Simon, Geisbert, Josephus
Den bouff, allie, jeffrey
Polo, Alessandro
Tinemans, Patriceus, Aloysius, Jacobs
Sherekens, Adrianis, Johannes, Hendrickas
Willow onion Dust Gerdi, Ellahe
Corne, Willem, Marie, Julia, Marcel
Bogart, eric, willem
Whisman, Simon, Reynaldo
Den bouff, allie, jeffrey
Polo, Alessandro
Tinemans, Patriceus, Aloysius, Jacobs
Sherekens, Adrianis, Johannes, Hendrickas
Willow onion Dust Gerdi, Ellahe
Corne, Willem, Marie, Julia, Marcel
Bogart, eric, willem
Whisman, Simon, Reynaldo
Application Number:
JP2019175168A
Publication Date:
June 17, 2020
Filing Date:
September 26, 2019
Export Citation:
Assignee:
AS M Netherlands B.V.
International Classes:
G03F9/00; G01B11/00; G03F7/20
Domestic Patent References:
| JP7142328A | ||||
| JP8288197A | ||||
| JP2004148814A | ||||
| JP2005268237A | ||||
| JP2008532320A |
Foreign References:
| WO2013152878A2 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito