Title:
露光装置、並びにディスプレイ及びデバイスの製造方法
Document Type and Number:
Japanese Patent JP6734573
Kind Code:
B2
Abstract:
To reduce a traveling distance of a mask during scanning exposure when a substrate is subjected to scanning exposure using a plurality of exposure regions.SOLUTION: An exposure apparatus is provided, which relatively moves a mask M having a predetermined pattern and an object P in a scanning direction with respect to illumination light so as to transfer the predetermined pattern onto the object P by scanning exposure via a projection optical system. The exposure apparatus includes: a first movable body holding the mask M; a second movable body holding the object P; a field stop for setting a shape of an illumination region on the object to be illuminated with the illumination light; a light-shielding plate for blocking a part of an optical path of the illumination light corresponding to the illumination region set by the field stop; a first drive unit for moving the light-shielding plate to a non-scanning direction that intersects the scanning direction; a second drive unit for relatively moving the first movable body and the second movable body with respect to the projection optical system in the scanning direction so as to subject the object P to scanning exposure; and a control unit for controlling the first drive unit.SELECTED DRAWING: Figure 3
Inventors:
Tajima Nojima
Akihito Shirato
Akihito Shirato
Application Number:
JP2019055525A
Publication Date:
August 05, 2020
Filing Date:
March 22, 2019
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20
Domestic Patent References:
JP2016001258A | ||||
JP2004335864A | ||||
JP2002099097A | ||||
JP2013238670A | ||||
JP2003151880A | ||||
JP2000331909A | ||||
JP2008089941A | ||||
JP11219892A | ||||
JP2001308003A | ||||
JP10062809A |
Attorney, Agent or Firm:
Satoshi Omori