Title:
処理液及び処理方法
Document Type and Number:
Japanese Patent JP6739777
Kind Code:
B2
Abstract:
According to one embodiment, a treatment solution is provided. The treatment solution is used for treating halosilanes having a cyclic structure. The treatment solution includes at least one of an inorganic base or an organic base and being basic.
Inventors:
Kenya Uchida
Hiroyuki Fukui
Uematsu Ikusei
Takeaki Iwamoto
Sousou
Hiroyuki Fukui
Uematsu Ikusei
Takeaki Iwamoto
Sousou
Application Number:
JP2019552641A
Publication Date:
August 12, 2020
Filing Date:
October 25, 2018
Export Citation:
Assignee:
Toshiba Corporation
Tohoku University
Tohoku University
International Classes:
H01L21/205; C01B33/107; C01B33/113; C23C16/44
Domestic Patent References:
| JP1257119A | ||||
| JP2016013965A | ||||
| JP2013125810A | ||||
| JP2009279567A | ||||
| JP2012158815A | ||||
| JP10060656A | ||||
| JP2006086166A | ||||
| JP2017054862A |
Other References:
三菱マテリアル株式会社四日市工場爆発火災事故調査委員会,三菱マテリアル株式会社四日市工場高純度多結晶シリコン製造施設爆発火災事故調査報告書,日本,[オンライン],2014年 6月12日,[検索日 2018.11.22],第24頁,URL,http://www.mmc.co.jp/corporate/ja/news/press/2014/pdf/14-0612a.pdf
Attorney, Agent or Firm:
Kurata Masatoshi
Nobuhisa Nogawa
Takashi Mine
Naoki Kono
Sanae Kaneko
Nobuhisa Nogawa
Takashi Mine
Naoki Kono
Sanae Kaneko