固体二酸化炭素粒子によるチャンバ部品の洗浄

Title:

固体二酸化炭素粒子によるチャンバ部品の洗浄

Document Type and Number:

Japanese Patent JP6762880

Kind Code:

B2

Abstract:

Disclosed herein are systems and methods for cleaning a ceramic article using a stream of solid carbon dioxide (CO2) particles. A method includes flowing liquid CO2 into a spray nozzle, and directing a first stream of solid CO2 particles from the spray nozzle toward a ceramic article for a first time duration to clean the ceramic article. The liquid CO2 is converted into the first stream of solid CO2 particles upon exiting the spray nozzle. The first stream of solid CO2 particles causes a layer of solid CO2 to be formed on the ceramic article. After the layer of solid CO2 has sublimated, a second stream of solid CO2 particles is directed from the spray nozzle toward the ceramic article for at least one of the first time duration or a second time duration to further clean the ceramic article.

More Like This:

JP4753656	Method for controlling boron contamination on the surface of silicon wafers
JP6008053	A grinding method of a wafer, and a polish device of a wafer
JP2002270569	WAFER TREATMENT DEVICE

Inventors:

Suseong Mun
Guo Yuan Hong
Suan Guangchi
Agarwal Pull Kit

Application Number:

JP2016575774A

Publication Date:

September 30, 2020

Filing Date:

June 23, 2015

Export Citation:

Click for automatic bibliography generation Help