Title:
反射型マスクブランクおよび反射型マスクブランクの製造方法
Document Type and Number:
Japanese Patent JP6766676
Kind Code:
B2
Abstract:
To provide a reflective mask blank having pseudo defects significantly excluded. The reflective mask blank comprises a substrate, a reflective layer for reflecting EUV light, formed on the substrate, and an absorber layer for absorbing EUV light, formed on the reflective layer, wherein Ssk<1.0 is satisfied, where Ssk is skewness in a region of 1 μm×1 μm on the absorber layer side surface.
Inventors:
Hiroshi Hanekawa
Application Number:
JP2017026462A
Publication Date:
October 14, 2020
Filing Date:
February 15, 2017
Export Citation:
Assignee:
AGC Inc.
International Classes:
G03F1/24; G03F1/54; G03F1/84
Domestic Patent References:
| JP2113375A | ||||
| JP2011240551A |
Foreign References:
| WO2012026463A1 | ||||
| WO2014050891A1 |
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito