Title:
後処理装置、後処理装置の制御方法
Document Type and Number:
Japanese Patent JP6776713
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a post-processing device that can suppress deformation of a medium in a stacker and smoothly execute post-processing.SOLUTION: A post-processing device includes: a stacker 328 temporarily placing a medium M thereon; a post-processing part for executing post-processing with respect to the medium while being placed on the stacker; a paper discharge tray for stacking discharged medium thereon; and a suppression part 450 for suppressing deformation of the medium with respect to the medium while being placed on the stacker.SELECTED DRAWING: Figure 12
Inventors:
Hidetoshi Kodama
Hirohisa Adachi
Yutaro Harada
Hirohisa Adachi
Yutaro Harada
Application Number:
JP2016156219A
Publication Date:
October 28, 2020
Filing Date:
August 09, 2016
Export Citation:
Assignee:
Seiko Epson Corporation
International Classes:
B65H29/70; B65H31/32; B65H37/00
Domestic Patent References:
| JP2015182835A | ||||
| JP2013010213A | ||||
| JP2007084337A |
Attorney, Agent or Firm:
Kazuaki Watanabe
Satoshi Nakai
Hiroki Matsuoka
Satoshi Nakai
Hiroki Matsuoka