Title:
洗浄装置
Document Type and Number:
Japanese Patent JP6783624
Kind Code:
B2
Abstract:
The subject of the present invention is to suppress the attachment of foreign materials. The present invention provides a cleaning device (1), which comprises: a chuck table (2), a rotational shaft unit (3), a cleaning fluid supply nozzle (6), a cleaning chamber (8), and an air exhaust unit (9). The rotational shaft unit (3) is provided with a bearing portion (5) and a shaft portion (4) capable of rotatably supporting the chuck table (2). The cleaning fluid supply nozzle (6) supplies the cleaning fluid to a wafer (W). The cleaning room chamber (8) forms a cleaning room. The air exhaust unit (9) exhausts the atmosphere in the cleaning room chamber (8). The cleaning device (1) is characterized in that the cleaning room chamber (8) is provided with an opening (814) at the bottom. The opening (814) is protruded from the front end of the shaft portion (4) of the rotational shaft unit (3) for supporting the chuck table (2) from the back side. A sealing member (86) is mounted on the inner side wall (833) vertically disposed on the periphery of the opening (814) for preventing the atmosphere from intruding into the cleaning room chamber (8) from the opening (814). The sealing member (86) is provided with a ring-shaped main body portion (861) disposed on the inner side wall (833), and an extension portion (862) extending from the ring-shaped main body portion (861). The upper end of the extension portion (862) is in contact with the back side of the chuck table (2).
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Inventors:
Eiji Yamamura
Application Number:
JP2016210430A
Publication Date:
November 11, 2020
Filing Date:
October 27, 2016
Export Citation:
Assignee:
Disco Co., Ltd.
International Classes:
H01L21/304
Domestic Patent References:
| JP2000100906A | ||||
| JP58144834U | ||||
| JP2012015347A |
Attorney, Agent or Firm:
Sakai International Patent Office