Title:
塩、酸発生剤、レジスト組成物及びレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP6783626
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a salt capable of producing a resist pattern with good CD uniformity, an acid generator, and a resist composition containing the same.SOLUTION: The salt represented by formula (I), the acid generator, and the resist composition are provided. [In formula, Qand Qeach independently represent a fluorine atom or a 1-6C perfluoroalkyl group; Lrepresents a 1-24C divalent saturated hydrocarbon group; -CH- contained in the saturated hydrocarbon group may be substituted with -O- or -CO-; a hydrogen atom contained in the saturated hydrocarbon group may be substituted with a fluorine atom or a hydroxy group; Ad represents an adamantane triyl group; and Zrepresents an organic cation.]SELECTED DRAWING: None
Inventors:
Hiroshi Sakamoto
Mutsuko Higo
Koji Ichikawa
Mutsuko Higo
Koji Ichikawa
Application Number:
JP2016213199A
Publication Date:
November 11, 2020
Filing Date:
October 31, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; G03F7/004; G03F7/038; G03F7/039; G03F7/20
Domestic Patent References:
| JP2010044374A | ||||
| JP2012226325A | ||||
| JP2013166747A | ||||
| JP2011046694A | ||||
| JP2012189977A | ||||
| JP2014199389A | ||||
| JP2015196781A | ||||
| JP2012510639A | ||||
| JP2013047790A | ||||
| JP2017095445A | ||||
| JP2017095446A | ||||
| JP2017095447A |
Foreign References:
| US3005014 |
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation