Title:
パターン形成用自己組織化組成物及びパターン形成方法
Document Type and Number:
Japanese Patent JP6801671
Kind Code:
B2
Abstract:
An object of the present invention is to provide a self-assembly composition for pattern formation, which is capable of forming a favorable phase-separated structure even in the case of forming a large size pattern. In addition, another object of the present invention is to provide a self-assembly composition for pattern formation, which is capable of forming a pattern by a simple process, with no need for preparation of a under layer, etc., upon formation of a fine pattern structure. The present invention relates to a self-assembly composition for pattern formation, which comprises a block copolymer comprising a polymerization unit (a) comprising two or more units consisting of at least one type selected from a glucose unit and a xylose unit, and a polymerization unit (b) comprising two or more units consisting of at least one type selected from an aromatic ring-containing unit, a silicon-containing unit and a metal-containing unit.
Inventors:
Kazuyo Morita
Application Number:
JP2017557741A
Publication Date:
December 16, 2020
Filing Date:
September 29, 2016
Export Citation:
Assignee:
Oji Holdings Co., Ltd.
International Classes:
B05D3/10; C08G81/02; B05D7/24; C08L5/00; C08L25/00; C08L43/04; H01L21/027
Domestic Patent References:
| JP2014527089A | ||||
| JP2014005325A | ||||
| JP2011518652A |
Other References:
宮本武明、山田憲司,糖鎖高分子の機能材料への応用,高分子,1996年 8月 1日,Vol.45, No.8,p.553-557
Attorney, Agent or Firm:
Patent Service Corporation Patent Office Sykes