Title:
基材上に平坦化膜又はマイクロレンズを形成するために用いられるエネルギー感受性組成物、硬化体の製造方法、硬化体、マイクロレンズの製造方法、及びＣＭＯＳイメージセンサ
Document Type and Number:
Japanese Patent JP6807226
Kind Code:
B2
Abstract:
Provided are an energy-sensitive composition which has excellent low-temperature curability and is used for forming a planarization film or a microlens on a substrate, a method of producing a cured body, the cured body, a method of producing the microlens, and a CMOS image sensor. The energy-sensitive composition of the present invention, as the energy-sensitive composition for forming the planarization film or the microlens on the substrate, comprises a resin (A) and a thermal acid generator (B). The resin (A) has a structural unit (a1) derived from hydroxyl group-containing (meth)acrylic acid derivatives and an acid generating temperature of the thermal acid generator (B) observed in differential scanning calorie measurement is 100 DEG C to 200 DEG C. The energy-sensitive composition further comprises an acid crosslinking structure (C), the acid crosslinking structure (C) is a partial structure of a polymer (C1) or a monomer (C2), and the polymer (C1) may be the resin (A).
Inventors:
Shingo Isobe
Shinobu Shimizu
Yuri Ikeda
Tomoyuki Inoue
Shinobu Shimizu
Yuri Ikeda
Tomoyuki Inoue
Application Number:
JP2016239761A
Publication Date:
January 06, 2021
Filing Date:
December 09, 2016
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G02B1/04; C08F220/10; C09D5/00; C09D7/63; C09D133/00; G02B3/00; G03F7/004; G03F7/023; G03F7/20; G03F7/40
Domestic Patent References:
| JP2016194079A | ||||
| JP200959959A | ||||
| JP200733518A | ||||
| JP2010117439A | ||||
| JP2013535562A | ||||
| JP2014137435A | ||||
| JP2013117662A |
Foreign References:
| WO2016031580A1 |
Attorney, Agent or Firm:
Masayuki Masabayashi