Title:
成膜装置
Document Type and Number:
Japanese Patent JP6809304
Kind Code:
B2
Abstract:
A film forming apparatus includes first and second processing gas supply parts for respectively supplying first and second processing gases to the substrate, and a separation region formed between first and second processing regions to separate an atmosphere of the first processing region to which the first processing gas is supplied and an atmosphere of the second processing region to which the second processing gas is supplied. The separation region includes: a separation region forming member including edge portions radially extending from a rotation center to a peripheral edge of a rotary table and for forming a narrow space between the edge portions and the rotary table, and a concave portion provided in a region sandwiched between adjacent edge portions and for forming a buffer space; and a separation gas supply part for supplying a separation gas into the buffer space.
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Inventors:
Yu Sasaki
Kosuke Takahashi
Bunro Hayase
Kosuke Takahashi
Bunro Hayase
Application Number:
JP2017046479A
Publication Date:
January 06, 2021
Filing Date:
March 10, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H01L21/31; C23C16/455; H01L21/316
Domestic Patent References:
| JP2016539506A | ||||
| JP2014022653A | ||||
| JP2015084362A | ||||
| JP2012084598A | ||||
| JP50001315Y1 | ||||
| JP2011135003A | ||||
| JP2014017296A |
Attorney, Agent or Firm:
Patent Corporation Yayoi Patent Office
Toshio Inoue
Nobuaki Takizawa
Toshio Inoue
Nobuaki Takizawa