Title:
リソグラフィ装置、パターン形成方法及び物品の製造方法
Document Type and Number:
Japanese Patent JP6828107
Kind Code:
B2
Abstract:
To provide a lithography device for forming an alignment mark for suppressing an influence on a pattern formed on a substrate.SOLUTION: A lithography device has a formation part for forming an alignment mark on a substrate by irradiating light onto the substrate containing a photosensitizer, and a transfer part for aligning the substrate based on a position of the alignment mark, and transferring a pattern onto the substrate by irradiating the photosensitizer with exposure light, in which the formation part irradiates a base material of the photosensitizer with irradiation light having a wavelength different from the exposure light, and forms an alignment mark on the material by processing the material by energy of the irradiation light.SELECTED DRAWING: Figure 2
Inventors:
Hiroaki Itabashi
Takuji Maruta
Nakamichi Toru
Tomonori Tsukahara
Takuji Maruta
Nakamichi Toru
Tomonori Tsukahara
Application Number:
JP2019158671A
Publication Date:
February 10, 2021
Filing Date:
August 30, 2019
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F9/00; G03F7/20
Domestic Patent References:
| JP5315215A | ||||
| JP6584567B1 | ||||
| JP2017130495A | ||||
| JP2005268747A | ||||
| JP2015138928A | ||||
| JP2005092137A | ||||
| JP2017016069A | ||||
| JP2004279873A | ||||
| JP2008192920A | ||||
| JP2008233781A | ||||
| JP2006017975A | ||||
| JP2006073779A |
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa
Sogo Kuroiwa