Title:
基板の製造方法およびそれを用いた発光素子の製造方法
Document Type and Number:
Japanese Patent JP6834492
Kind Code:
B2
Abstract:
The present invention provides a method of producing a substrate on the surface of which the curved surface pattern is carved, using a resin composition that can afford a cured film which can be formed into a resist pattern in curved surface shape, which does not cause resist burning and carbonization even in high-output dry etching processing subject to a high temperature, and which has good etching selectivity and post-etching removability. The present invention is a method of producing a patterned substrate, the method including the steps of: providing, on a substrate, a coating film of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, copolymers of at least two of the resins, and copolymers of at least one of the resins and another structural unit, (B) a photoacid generator, and (C) at least one compound selected from the group consisting of epoxy compounds and oxetane compounds; forming a pattern of the coating film; patterning the substrate through etching using the pattern of the coating film as a mask; and removing the coating film of the resin composition.
Inventors:
Hideyuki Kobayashi
Tomoyuki Yuba
Tomoyuki Yuba
Application Number:
JP2016572599A
Publication Date:
February 24, 2021
Filing Date:
October 27, 2016
Export Citation:
Assignee:
TORAY INDUSTRIES,INC.
International Classes:
G03F7/09; C08G73/10; G03F7/004; G03F7/023; G03F7/075; G03F7/20; G03F7/40; H01L33/22; H01L33/32
Domestic Patent References:
| JP2014170080A | ||||
| JP2014191002A | ||||
| JP2014163999A | ||||
| JP2007106779A | ||||
| JP2008083467A | ||||
| JP2008107512A |