Title:
照明システム
Document Type and Number:
Japanese Patent JP6845562
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To make a uniform correction of illuminance distribution at an observation region such as a microscope when light emitted from a light source is applied to the observation region.SOLUTION: It is acknowledged that when light is emitted from a light source and applied to said observation region, illumination intensity levels of said light at an illumination surface set in a virtual mode in front of said observation region are different among regions in said irradiation surface and the illumination distribution of said different illumination intensity levels is influenced by said observation region and becomes uneven. On the basis of this acknowledgement, there is provided a transmission factor setting part for setting a transmission factor for said observation region for light emitted from said light source to a light source system for outputting a lighting light. Said transmission factor is locally set at said transmission factor setting part in correspondence with the illumination distribution of different illumination intensity levels at the virtual surface set at a front part of said observation region, thereby the illumination distribution of said light at said observation region is uniformly corrected.SELECTED DRAWING: Figure 1
Inventors:
Kiyoshi Ito
Tomio Kobayashi
Shigemitsu Koga
Kentaro Asakura
Tomio Kobayashi
Shigemitsu Koga
Kentaro Asakura
Application Number:
JP2016251478A
Publication Date:
March 17, 2021
Filing Date:
December 26, 2016
Export Citation:
Assignee:
Chuo Seiki Co., Ltd.
International Classes:
F21L4/00; F21V8/00; F21V11/04; F21V11/08; F21V13/00; F21V14/08; G02B21/06
Domestic Patent References:
| JP2007033790A | ||||
| JP2009170424A | ||||
| JP2007133435A | ||||
| JP2015176780A |
Attorney, Agent or Firm:
Isamu Takahashi