Title:
フォトスペーサー用樹脂、フォトスペーサー用樹脂組成物、フォトスペーサー及びカラーフィルタ
Document Type and Number:
Japanese Patent JP6854147
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a photospacer that achieves both high flexibility and high restorability, a photospacer resin and a photospacer resin composition for forming the photospacer, and a color filter having the photospacer.SOLUTION: A photospacer resin contains a monomer unit A derived from a silicone-containing monomer represented by formula (1) and has an acid radical in a side chain of it. The photospacer resin further contains a structural unit B derived from a dioxolane-containing monomer (Ris H or a methyl group; Ris a C2-4 alkylene group; R's independently represent a C1-4 alkyl group or a substituted/unsubstituted phenyl group; n is a positive integer).SELECTED DRAWING: None
Inventors:
Sugiyama Dai
Application Number:
JP2017028191A
Publication Date:
April 07, 2021
Filing Date:
February 17, 2017
Export Citation:
Assignee:
Osaka Organic Chemical Industry Co., Ltd.
International Classes:
C08F8/46; C08F290/00; G02B5/20; G03F7/075
Domestic Patent References:
| JP2013160825A | ||||
| JP2008209739A | ||||
| JP2008116488A | ||||
| JP2008298859A | ||||
| JP2015025935A | ||||
| JP2009205137A |
Foreign References:
| WO2010001976A1 |
Attorney, Agent or Firm:
Patent Business Corporation Unias International Patent Office