Title:
パターン形成方法および物品製造方法
Document Type and Number:
Japanese Patent JP6864481
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a technique advantageous for forming a pattern efficiently in equipment in which a plurality of imprint apparatuses are assigned to one projection exposure apparatus.SOLUTION: A method of forming a pattern on a substrate includes: a first step of forming a group of first patterns so as to define a first region on each of a plurality of substrates by using a projection exposure apparatus; and a second step of forming a group of second patterns so as to define a second region on the first region of each of substrates different from each other among the plurality of substrates by using a plurality of imprint apparatuses. A plurality of second regions, which are respectively defined by the plurality of imprint apparatuses in the second step, are different in shape but have a common component. In the first step, the first regions are deformed in accordance with the common component.SELECTED DRAWING: Figure 7
Inventors:
Tatsuya Hayashi
Takenori Emoto
Takenori Emoto
Application Number:
JP2017004610A
Publication Date:
April 28, 2021
Filing Date:
January 13, 2017
Export Citation:
Assignee:
Canon Inc
International Classes:
H01L21/027; B29C59/02; G03F7/20; G03F9/00
Domestic Patent References:
| JP2015029070A | ||||
| JP2012204833A | ||||
| JP2009295919A | ||||
| JP2002134396A | ||||
| JP2013098291A |
Foreign References:
| US20100102470 | ||||
| CN103186052A |
Attorney, Agent or Firm:
Patent Business Corporation Otsuka International Patent Office