Title:
被覆部材、表面被覆金型、及び成膜方法
Document Type and Number:
Japanese Patent JP6887606
Kind Code:
B2
Abstract:
Disclosed herein is a vanadium-based coating film having a high film hardness. When subjected to X-ray diffraction using Cu Ka radiation, the vanadium-based coating film has peaks at diffraction angles 2¸ of 29.9 degrees or more but 30.3 degrees or less, 33.2 degrees or more but 33.6 degrees or less, and 69.8 degrees or more but 70.6 degrees or less, and has a maximum intensity at a diffraction angle 2¸ of 33.2 degrees or more but 33.6 degrees or less. This vanadium-based coating film has a film hardness HV of 3500 to 5000, and therefore has a hardness higher than those of conventional vanadium-based coating films.
Inventors:
Yasuhiro Kitagishi
Nanjo Yoshiyasu
Nanjo Yoshiyasu
Application Number:
JP2017549124A
Publication Date:
June 16, 2021
Filing Date:
November 04, 2016
Export Citation:
Assignee:
Fujita Giken Co., Ltd.
International Classes:
C23C14/06; B21D37/01; B21D37/20; B23B27/14
Domestic Patent References:
| JP2002371352A | ||||
| JP2005046975A |
Foreign References:
| WO2013047548A1 |
Other References:
SANJINES,R. et al.,Hexagonal nitride coatings:electronic and mechanical properties of V2N,Cr2N and δ-MoN,Thin Solid Films,1998年,vol.332,p.225-229
SANJINES,R. et al.,Chemical bonding and electronic structure in binary VNy and ternary T1-xVxNy nitrides,J.Appl.Phys.,1998年 2月 1日,Vol.83,第3号,p.1396-1402
SANJINES,R. et al.,Chemical bonding and electronic structure in binary VNy and ternary T1-xVxNy nitrides,J.Appl.Phys.,1998年 2月 1日,Vol.83,第3号,p.1396-1402
Attorney, Agent or Firm:
Toshihiro Yokoi