Title:
ポリアルキレンエーテルグリコール及びその製造方法
Document Type and Number:
Japanese Patent JP6926587
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a polyalkylene ether glycol having excellent light resistance and a method of producing the same.SOLUTION: A polyalkylene ether glycol contains a repeating unit having a C6-20 alkylene group and an ether bond, and has a hydroxyl value of 1.970-1.999. There is also provided a method for producing a polyalkylene ether glycol, characterized by hydrolyzing at a temperature higher than 100°C an ester group occurring at a terminal of a polyalkylene ether glycol obtained by dehydration condensation with a polycondensation catalyst.SELECTED DRAWING: None
Inventors:
Kazuki Fukumoto
Kotoku Kawakami
Kotoku Kawakami
Application Number:
JP2017064001A
Publication Date:
August 25, 2021
Filing Date:
March 28, 2017
Export Citation:
Assignee:
Mitsubishi Chemical Corporation
International Classes:
C08G65/34
Domestic Patent References:
| JP2008045098A |
Attorney, Agent or Firm:
Tsuyoshi Shigeno