Title:
ペリクルの製造方法
Document Type and Number:
Japanese Patent JP6944768
Kind Code:
B2
Abstract:
A method for manufacturing of a pellicle that can simplify the manufacturing process is provided.The method for manufacturing of a pellicle comprises a step for forming a SiC film on a bottom surface of a Si substrate, a step for bonding a supporting member including a through hole to a bottom surface of the SiC film, and a step for removing the Si substrate, after bonding the supporting member.
Inventors:
Hidehiko Oku
Shuichiro
Shuichiro
Application Number:
JP2016167257A
Publication Date:
October 06, 2021
Filing Date:
August 29, 2016
Export Citation:
Assignee:
Air Water Inc.
International Classes:
C30B29/36; C30B25/02; G03F1/62; H01L21/306
Domestic Patent References:
| JP2012119655A | ||||
| JP9310170A | ||||
| JP2009271262A |
Foreign References:
| US20050025959 | ||||
| WO2014188710A1 |
Attorney, Agent or Firm:
Yutaka Tsubaki
Ishikawa Tatsuro
Tsuyoshi Shiraka
Ishikawa Tatsuro
Tsuyoshi Shiraka