Title:
ロードポート及び搬送室
Document Type and Number:
Japanese Patent JP6947993
Kind Code:
B2
Abstract:
To maintain the inside of a transfer chamber at a high degree of cleanliness such that oxygen and moisture do not adhere to a wafer or the like that is a transfer target.SOLUTION: A transfer chamber includes a transport space 9 filled with an inert gas circulated inside, a base 21 forming a part of a wall separating the transfer space from an external space, an opening 42 provided in the base, a door 51 that opens and closes the opening and faces a lid 32 of a container 7 containing a content to fix and release the lid, sealing members 43 and 44 that seal between the base and the door, and a door clamp that presses the door against the base to improve the sealing performance between the base and the door with the seal member.SELECTED DRAWING: Figure 7
Inventors:
Tatsuya Miura
Ogura Gengoro
Takashi Shigeta
Yukio Ogasawara
Toshihiro Kawai
Ikushi Taniyama
Ogura Gengoro
Takashi Shigeta
Yukio Ogasawara
Toshihiro Kawai
Ikushi Taniyama
Application Number:
JP2020057237A
Publication Date:
October 13, 2021
Filing Date:
March 27, 2020
Export Citation:
Assignee:
Sinfonia Technology Co., Ltd.
International Classes:
H01L21/677
Domestic Patent References:
| JP2012195438A | ||||
| JP2015146347A | ||||
| JP2006074033A |