Title:
モノリシックモジュラー高周波プラズマ源
Document Type and Number:
Japanese Patent JP7336591
Kind Code:
B2
Abstract:
Embodiments disclosed herein include a monolithic source array. In an embodiment, the monolithic source array comprises a dielectric plate having a first surface and a second surface opposite from the first surface. The monolithic source array may further comprise a plurality of protrusions that extend out from the first surface of the dielectric plate, wherein the plurality of protrusions and the dielectric plate are a monolithic structure.
Inventors:
Choa, Thai Chung
Klaus, Philip Allen
Klaus, Philip Allen
Application Number:
JP2022518721A
Publication Date:
August 31, 2023
Filing Date:
September 15, 2020
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H05H1/46; C23C16/505
Domestic Patent References:
| JP2011192912A | ||||
| JP2017168186A |
Foreign References:
| WO2004032176A1 | ||||
| WO2008099896A1 | ||||
| CN103956315A |
Attorney, Agent or Firm:
Sonoda & Kobayashi Patent Attorneys Corporation