Title:
反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法
Document Type and Number:
Japanese Patent JP7361027
Kind Code:
B2
Abstract:
Provided is a reflective mask blank with which it is possible to further reduce the shadowing effect of a reflective mask, and also possible to form a fine and highly accurate phase-shift pattern. A reflective mask blank having, in the following order on a substrate, a multilayer reflective film and a phase-shift film that shifts the phase of EUV light, said reflective mask blank characterized in that the phase-shift film has a thin film comprising a metal-containing material that contains: ruthenium (Ru); and at least one element from among chromium (Cr), nickel (Ni), (Co), aluminum (Al), silicon (Si), titanium (Ti), vanadium (V), germanium (Ge), niobium (Nb), molybdenum (Mo), tin (Sn), tellurium (Te), hafnium (Hf), tungsten (W), and rhenium (Re).
Inventors:
Yohei Ikebe
Tsutomu Shoki
Tsutomu Shoki
Application Number:
JP2020520391A
Publication Date:
October 13, 2023
Filing Date:
May 24, 2019
Export Citation:
Assignee:
HOYA Corporation
International Classes:
G03F1/24; G03F1/32; G03F7/20
Domestic Patent References:
| JP2015122468A | ||||
| JP2005516380A | ||||
| JP2017227936A |
Foreign References:
| US20160238924 | ||||
| US20050084768 |
Attorney, Agent or Firm:
Patent Attorney Corporation Tsukuni